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PVD Coating Explained

This video explains how PVD works and the different methods, including thermal evaporation, e-beam and sputtering. Feel free to comment any questions you have about PVD or about Korvus' HEX series. If you want to learn more about Korvus and read about our products, you can view the links below: ⬡ Visit our site: https://korvustech.com ⬡ Learn more about the HEX: https://korvustech.com/thin-film-depo... ⬡ Contact us: https://korvustech.com/contact-us ⬡ Read our article about physical vapour deposition: https://korvustech.com/what-is-pvd-co... Transcript: Physical Vapour Deposition, or PVD, is a process used to produce thin films and coatings. PVD techniques are widely used in various industries, including electronics, optics, semiconductors, and green energy, due to their ability to create high-quality, durable, and precisely-controlled coatings. These coatings can range from a few atoms to tens of thousands of atoms (or “microns”) thick. The deposition is achieved by vaporising the material - or target - in a vacuum environment and allowing the vapour to condense onto the substrate. Common PVD techniques include thermal evaporation where an electrical current is passed through a filament, which holds the source material. This raises the temperature of the material via resistive heating until it evaporates. The vapour cloud generated by this source material travels through the chamber and sticks to the substrate as a thin film coating. Another PVD process is E-beam evaporation; which is similar to thermal evaporation but the filament emits electrons as it is heated up. And these electrons are then accelerated through a voltage towards the evaporant. The electrons collide with the atoms in the evaporant material, causing it to heat up and evaporate, creating a thin coating on the substrate. Sputtering is another popular method of thin film deposition. Sputter deposition uses the kinetic energy of fast-moving ions in a plasma to vaporise a coating material, which will then be deposited onto a “substrate” as a thin film. So what are the advantages of PVD coating? The first is High Purity and Quality: The vacuum environment inside the chamber minimises contamination. Another benefit of PVD is that the coatings will typically adhere well to the substrate. PVD coating also has Environmental Benefits. PVD processes are generally more environmentally friendly than traditional chemical plating methods. And finally, flexibility. The variety of PVD techniques available means that you can make layers of many different classes of materials, and fine tune the properties of these films. PVD coating does have some downsides, however; The first is cost since the equipment and processes can be expensive. Another drawback is the complexity. These PVD processes require precise control over their parameters. PVD is a versatile and effective method for creating high-performance coatings that have the potential to further advance scientific breakthroughs across multiple industries. At Korvus Technology, we’ve created the HEX Series of highly modular thin film deposition systems. The HEX series is ideal for exploring novel coating technologies. Feel free to get in touch with us today and we’ll be happy to help.

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