Lam Research's Akara Features Breakthrough Innovation in Plasma Etch for the 3D Chipmaking Era скачать в хорошем качестве

Lam Research's Akara Features Breakthrough Innovation in Plasma Etch for the 3D Chipmaking Era

Introducing Akara®, a new conductor etch tool for Lam's Sense.i® platform, featuring innovative technologies such as Lam's DirectDrive® solid-state plasma source, TEMPO, and SNAP. Akara allows for ultra-high etch selectivity and atomic precision in shaping etched profiles, which enable it to meet the critical etch challenges of current and future semiconductor devices. Akara's integration with the Sense.i platform: enables automated replacement of consumables for lights-out fabrication and minimizes defects for higher yield rates. Akara represents a revolutionary step forward for Lam and our customers, building on the proven legacy of Lam's industry-leading conductor etch products and raising the bar to new heights. Explore careers today at: https://bit.ly/careersatlam Website: https://www.lamresearch.com/ Social Media: LinkedIn:   / lam-research   Facebook:   / lamresearchcorporation   X:   / lamresearch   Instagram:   / lam.research