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14 nanometer

The 14 nanometer (14 nm) semiconductor device fabrication node is the technology node following the 22 nm/(20 nm) node. The naming of this technology node as "14 nm" came from the International Technology Roadmap for Semiconductors (ITRS). By current estimates the 14 nm technology is projected to be reached by semiconductor companies in the 2014 timeframe. 14 nm resolution is difficult to achieve in a polymeric resist, even with electron beam lithography. In addition, the chemical effects of ionizing radiation also limit reliable resolution to about 30 nm, which is also achievable using current state-of-the-art immersion lithography. Hardmask materials and multiple patterning will be required. This video is targeted to blind users. Attribution: Article text available under CC-BY-SA Creative Commons image source in video