High-throughput Screening of Extreme Ultraviolet Photoresists using Molecular Layer Deposition скачать в хорошем качестве

High-throughput Screening of Extreme Ultraviolet Photoresists using Molecular Layer Deposition

How do we create features smaller than 10 nanometers? The answer lies in the next generation of Extreme Ultraviolet (EUV) Photolithography. In this seminar from February 6, 2026, Dr. David Bergsman from the University of Washington takes us inside the Bergsman Group’s cutting-edge work on organic-inorganic hybrid thin films. Using Molecular Layer Deposition (MLD), they are tackling the biggest hurdles in semiconductor manufacturing: light absorption, structural integrity, and the prevention of pattern collapse at the sub-10 nm scale. 🎙️ About the Speaker Dr. David Bergsman is an Assistant Professor of Chemical Engineering at the University of Washington. A leader in atomic layer processing, he has received numerous accolades including the ACS PRF New Investigator Award and the AVS Paul H. Holloway Young Investigator Award. His research group is at the forefront of using nanotechnology to solve global challenges in electronics and sustainability. Stay on the cutting edge of nanotechnology! If you enjoyed this presentation, please Like the video and Subscribe to our channel for more weekly seminars from the world's leading researchers. // CONNECT WITH MICRON SCHOOL OF MATERIALS SCIENCE AND ENGINEERING // MSMSE’s Official Website: https://www.boisestate.edu/coen-mater... Apply to Boise State: https://www.boisestate.edu/admissions... Boise State MSMSE Official Instagram: @boise.state.msmse Boise State MSMSE Official Facebook:   / bsumaterialsscience   Boise State Official LinkedIn:   / msmse